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Film Photomask is a master plate used for integrated circuit wafer manufacturing, carrying relevant information of the integrated circuit design layout. In the wafer manufacturing process, the pattern on the Film Photomask is transferred to the exposed substrate material through a series of processes such as photoresist coating, exposure, and development to achieve pattern transfer.

A Photomask, also known as a light mask, photomask, or photolithography mask, is a master pattern used in the photolithography process in microelectronics manufacturing. The following is a detailed introduction to it:

When responding to the tariff adjustment by the United States, the optical industry needs to adopt multi-dimensional strategic measures to balance cost pressure, maintain market share and promote industrial upgrading. The following is the specific strategy analysis:

The impact of the United States' tariff adjustment on the optical industry presents multi-dimensional and deep-level characteristics, involving core areas such as industrial chain costs, market patterns, technological innovation and international cooperation. The following is the specific analysis: