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A Photomask, also known as a light mask, photomask, or photolithography mask, is a master pattern used in the photolithography process in microelectronics manufacturing. The following is a detailed introduction to it:

When responding to the tariff adjustment by the United States, the optical industry needs to adopt multi-dimensional strategic measures to balance cost pressure, maintain market share and promote industrial upgrading. The following is the specific strategy analysis:

The impact of the United States' tariff adjustment on the optical industry presents multi-dimensional and deep-level characteristics, involving core areas such as industrial chain costs, market patterns, technological innovation and international cooperation. The following is the specific analysis:

American standard resolution board (USAF 1951 resolution board) as a key tool in the field of optical inspection, its industry prospects are driven by technology upgrades, market demand growth and industry application expansion, showing a steady development trend.